Work

Guided random synthetic layout generation and machine-learning based defect prediction for leading edge technology node development

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051134

Authors: Geng Han, Mohamed Talbi, Monirul Islam, Rajiv Sejpal, Brad Austin, Rebekah Sheraw, Joe Kwan, Sophie Rissberger, Qian Xie, Alex Dolgonos, Bennett Smith, Shibing Wang, Xuefeng Zeng, Yuyang Sun

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655099

FWCI: 2.3

Cites: 5

Cited by: 1

Related to: 10