Work

Mitigating stitching-induced performance and yield losses in high-NA EUV lithography: place and route implementation approaches

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051175

Authors: Yongchan Ban, Kyoungin Cho, Jaewoo Seo, Gangsic Kim, Hosoon Shin, Kevin Lucas

Institution: Synopsys (United States)

Language: English

Topic: VLSI and FPGA Design Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655100

FWCI:

Cites: 7

Cited by:

Related to: 10