Work

Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051547

Authors: Kenichi Miyaguchi, Ryoung-Han Kim, Apoorva Oak, Youssef Drissi, Chieh-Miao Chang, Jeonghoon Lee, Yasser Sherazi, Darko Trivkovic, Ru-Gun Liu

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655101

FWCI: 2.293

Cites: 3

Cited by: 1

Related to: 10