Deep pattern solution for interpreting systematic defects
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050977
Authors: Minchul Park, Yeji Kim, Bogyeong Kang, Namjae Kim, Byungseon Choi, Hyunjae Jang, Ji-Hye Lee, SeongRyeol Kim, Young-Gu Kim, Jae-Hyun Kang, JoongWon Jeon, Dae Sin Kim, Hyunsuk Choi
Institution: Samsung Electronics (South Korea)
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655112