Work

Development of an OPC compact model integrating underlayer effects in metal oxide resists

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050104

Authors: Kyoungyoon Park, Dongyeul Lee, Yangwoo Heo, Pillsoo Kang, Useong Kim, Kyoil Koo, Seongjeon Choi, Seung-Hune Yang, Seongtae Jeong

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655113

FWCI:

Cites: 14

Cited by:

Related to: 10