Work

Enhancing OPC accuracy in 28nm-class analog devices: addressing degradation in specific BEOL patterns through recipe tuning and simulation

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3048585

Authors: Keeho Kim, Howard Huang, Mark Terry, Paul Gallogly, Jakin B. Delony, Scott W. Jessen

Institution: Texas Instruments (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655125

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