Work

OPC model accuracy of dry resist readiness for 0.55NA EUVL by using low-n bright field mask

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051855

Authors: Dongbo Xu, Werner Gillijns, Shruti Jambaldinni, Soobin Hwang, Anuja De Silva, Germain Fenger

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655129

FWCI:

Cites: 9

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Related to: 10