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Enhancing multilayer process defect prediction accuracy on an artificial intelligence/machine learning (AI/ML) platform

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051562

Authors: Jonathan Ho, Xiaoyuan Qi, Yuansheng Ma, Fan Jiang, Hongming Zhang, Joe Kwan, Le Hong

Institution: Advanced Micro Devices (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655141

FWCI:

Cites: 2

Cited by:

Related to: 10