A comparison of SALELE with traditional lithography and anti-spacer technology
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3051131
Authors: David Power, David Conklin, Jodi Grzeskowiak, Micheal Murphy, Xuefeng Zeng, Alex Wei, Yuyang Sun
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655147