Moore’s law meets high-NA EUV: random via patterning for next-generation nodes
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050453
Authors: Bhavishya Chowrira, Victor M. Blanco Carballo, Mircea Dusa, Ling Ee Tan, Hemant Vats, Werner Gillijns, Stefan Decoster, Ardavan Niroomand, Vito D. Rutigliani, Sandip Halder, Mahtab Sangghaleh, Dhruv Tyagi, Ali Kamali, Marcus Newman, Marc Demand, Yusuke Wako, Ainhoa Romo Negreira, Robert Clark, Kathleen Nafus, Martin O'Toole, Jeff Hsia
Institutions: IMEC, Tokyo Electron (Japan), ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655150