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Accelerating high-NA introduction with RET innovations

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052425

Authors: Harsha Grunes, Robert M. Bigwood, Can Guven, Ragu Venkatesan, Kaili Zhang, Vince Plachecki, Stephen Hsu, Itty Matthew, Ming-Chun Tien, Luc van Kessel, Ruben Maas, ChangAn Wang, Erfeng Ding, Bo Yan

Institutions: Intel (United States), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655153

FWCI: 2.293

Cites: 2

Cited by: 1

Related to: 10