Work

Dry resist process optimization at the 0.33NA resolution limit and validation via large area e-test inspection

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051708

Authors: Zhengtao Chen, Ali Haider, Stéphane Larivière, Etienne P. de Poortere, Victor M. Blanco Carballo, Anuja De Silva, Rich S. Wise

Institutions: IMEC, Lam Research (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655154

FWCI: 2.358

Cites:

Cited by: 1

Related to: 10