Detection sensitivity of actinic patterned mask inspection systems for high-NA EUV lithography
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3050110
Authors: Michiteru Mizoguchi, Itaru Matsugu, Ko Gondaira, Toshiyuki Todoroki, Hiroki Miyai
Institution: Lasertec Corporation (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655160