Work

High-NA imaging performance, a year of learnings after first light on wafer

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051437

Authors: Hilbert van Loo, Sofia Leitao, Stefan N. Smith-Meerman, Eelco van Setten, Guido Schiffelers, Jan van Schoot, Po-Cheng Lin, Amber de Bruijn, Bas van Meerten, Dennis Stoel, Tim Driessen, Ben Smith, Jose Sambricio

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655164

FWCI: 6.831

Cites:

Cited by: 3

Related to: 10