Work

EUV NTD resist modeling and mechanisms of deformation

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3052370

Authors: Ulrich Welling, Sou Kamimura, Bernd Küchler, Arjun Singh, Hironobu Taoka, Wolfgang Hoppe, Thomas Mülders

Institutions: Synopsys (Germany), Fujifilm (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655172

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