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Scaling EUV and holistic lithography to support Moore’s Law through the AI era

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3059296

Author: Christophe Fouquet

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655173

FWCI:

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