Measurement and adjustment of resist SWA in EUV lithography
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3051801
Authors: Jo Finders, Vidya Vaenkatesan, Lei Feng, Vishal Panchal, Richard Thorgate, James Robinson, Andrew D. L. Humphris, Jan van Schoot
Institution: ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655208