Improving local critical dimension uniformity (LCDU) from speckle reduction towards a k1 of 0.25
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051807
Authors: Will Conley, Stephen D. Hsu, Terunobu Kurosawa, Tom van Hemert
Institutions: ASML (United States), ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655214