Work

Enablement of 0.55NA EUV bright field mask stitching

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051285

Authors: Dongbo Xu, Qinglin Zeng, Werner Gillijns, Xuefeng Zeng, Yuyang Sun, Germain L. Fenger

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655249

FWCI: 2.358

Cites: 7

Cited by: 1

Related to: 10