Work

New EUV interference lithography tool at PSI: pushing the limits of resolution beyond hyper NA EUVL

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3049465

Authors: Dimitrios Kazazis, Stephan Maag, Marco Schneider, Achim Ammon, Emanuele Japichino, Michaela Vockenhuber, Markus Kropf, Lars Heller, Yasin Ekinci, Iacopo Mochi

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655251

FWCI: 2.277

Cites: 19

Cited by: 1

Related to: 10