Work

Progress towards adoption of high-NA EUV lithography in pilot manufacturing

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3051022

Authors: Herman Heijmerikx, Eelco van Setten, Sjoerd Lok, Jan van Schoot, Gunes Nakiboglu, Stef Hendriks, Rudy Peeters, Diederik de Bruin, Aysegul Cumurcu Gysen, Roel Boumen, Jörg Mallmann, Greet Storms, Peter Vanoppen

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655252

Cites:

Cited by: 2

Related to: 10