Work

NA0.33 EUV extension for HVM: testing single patterning limits

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052244

Authors: Philippe Leray, Mircea Dusa, Stephane Lariviere, Syamashree Roy, Victor M. Blanco Carballo, Lander Verstraete, Mihir Gupta, Bhavishya Chowrira, Ryoung-Han Kim, Hyo Seon Suh, Sandip Halder, Ru-Gun Liu

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655253

FWCI: 9.434

Cites: 4

Cited by: 4

Related to: 10