Lithography innovations for the artificial intelligence era
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050947
Authors: Alberto Pirati, Jeannot Driedonkx, Wim P. de Boeij, Elliott Mc Namara, Jeroen de Groot, Jorgen Kool, Peter ten Berge, Michael Kubis, Daan M. Slotboom, Gianluca Gattobigio, Aditya Deshpande, Jean Philippe van Damme, Antoine Kempen, Ahmed Zayed, Mohamed El Kodadi, Stefan C. J. A. Keij, Arjan Gijsbertsen, Yzzer Roman Gutierrez, Saurabh Singh
Institution: ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655258