Work

Influence of wafer topography on focus control and defectivity in EUV lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051869

Authors: Roel Gronheid, Huan Ren, Guojie Cheng, Kaushik Sah, Xu Gao, Weiwei Tang, Zhijin Chen, Khurram Zafar, Philip Groeger, Holger Bald, Gaetan De Liedekerke Beaufort, Boris Habets, Stephane Lariviere, Bart Baudemprez, Farid Sebaai

Institutions: KLA (United States), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655260

FWCI:

Cites: 1

Cited by:

Related to: 10