Work

Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050509

Authors: Gerardo Bottiglieri, Pieter Woltgens, Reinier van der Meer, Sander Blok, Bram Slachter, John McNamara, Mark A. van de Kerkhof, Jan van Schoot, Michael Patra, Jens Timo Neumann, Heiko Feldmann

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655266

FWCI: 13.66

Cites: 13

Cited by: 6

Related to: 10