EUV mask lifetime evaluation using stochastic process window through mask clean cycles
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3048333
Authors: Vineet V. Nair, Dave Kewley, Gisung Yoon, Russell A. Shoemake, Baorui Yang, Tom Boettiger, Brian Watson, Anil Karumuri, Loren Hoffman, Steve D. Snyder, Scott L. Light, Amy Weatherly, Ping Digaum
Institution: Micron (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655272