Work

Algebraic modeling of dose to size stochastic defects

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051447

Author: Mark Neisser

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655276

FWCI:

Cites: 6

Cited by:

Related to: 10