Work

Digital lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3046576

Authors: Chi-Ming Tsai, Thomas L. Laidig, Jang Fung Chen

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655277

FWCI: 9.434

Cites: 6

Cited by: 4

Related to: 10