Work

Resolution enhancement for high-NA extreme ultraviolet lithography using aperiodic multilayer masks

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051972

Authors: William Ethan Maguire, Bruce W. Smith

Institution: Rochester Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655280

FWCI: 2.293

Cites: 6

Cited by: 1

Related to: 10