Work

Multi-reticle stitching: applications from packaging to high-NA EUV

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051542

Authors: Christopher M. Bottoms, Richard C. Johnson, Romain J. Lallement, Cheuk Wun Wong, Alex R. Hubbard, Sarah N. Chowdhury, Jed H. Rankin

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655282

FWCI: 2.3

Cites: 13

Cited by: 1

Related to: 10