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Enhancing displacement Talbot lithography through inverse-designed curvilinear masks and multibeam mask writing

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3048417

Authors: Stefan Rietmann, Zhixin Wang, Martin Sczyrba, Christian Buergel, Li Wang, Sven Eiben, Bríd M. Connolly, Kelsey Wooley, Harun H. Solak

Institution: Advanced Mask Technology Center (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655283

FWCI:

Cites: 12

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Related to: 10