Work

Evaluating novel material stacks towards gate width roughness reduction

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051564

Authors: Gopal Sankar Kenath, Martin Burkhardt, Rajiv Sejpal, Yasiel Cabrera, Stuart Sieg, Indira Seshadri

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655285

FWCI:

Cites: 17

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Related to: 10