Work

Pupil optimization of EUV low-n attenuated phase shift mask for improvement of random contact hole patterning proceedings

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050373

Authors: Keon Huh, Yuna Jang, Sunggyu Lee, Heesun Jun, Heeyoung Go, Chang-Min Park

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655287

FWCI:

Cites: 12

Cited by:

Related to: 10