Work

Wafer edge defectivity and its correlation to process parameters

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051868

Authors: Huan Ren, Roel Gronheid, Kaushik Sah, Loemba Bouckou, Guojie Cheng, Xu Gao, Weiwei Tang, Zhijin Chen, Khurram Zafar, Craig D. Higgins, Cao Zhang, Philip Groeger, Holger Bald, Syamashree Roy, Victor Blanco

Institutions: KLA (United States), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655292

FWCI:

Cites: 1

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Related to: 10