Breaking down ADI line edge roughness from a DUV scanner into components
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051541
Authors: Brian Watson, Tom van Hemert, Jette van den Broeke, Anita Bouma, Vlad Temchenko, Ranjan Khurana, Vineet V. Nair, Stephen D. Snyder, Mycahya Eggleston, Ted L. Taylor, Guillaume Mernier, Christian Scholz, Jan Biller, Chris Perkins, Federica Riva, Will Henstrom
Institutions: Micron (United States), ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655294