Work

Modeling photoacid diffusion in chemically amplified resists via proximity effect correction in electron beam lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051165

Authors: Xinpei Wu, Nikhil M. Tiwale, Aaron Stein, Chang-Yong Nam

Institutions: Brookhaven National Laboratory, Stony Brook University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655340

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Cites: 19

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Related to: 10