Work

High-performance metal organic cluster resists for high-NA extreme ultraviolet lithography

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3052190

Authors: Manvendra Chauhan, Neha Sharma, Kumar Palit, Ranbir Singh, Abhimanew Dhir, Robin Khosla, Bhaskar Mondal, Satinder Kumar Sharma, Ralph R. Dammel, Ravi Kanjolia

Institution: Indian Institute of Technology Mandi

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655418

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Cites: 11

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Related to: 10