Work

HVM readiness of dry resist patterning solutions

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3055139

Author: Rich S. Wise

Institution: Lam Research (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655683

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Related to: 10