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Computational-aided etch process innovation

Year: 2025

Type: conference-abstract

DOI: 10.1117/12.3051466

Authors: Yu-Hao Tsai, Du Zhang, Akiteru C. Ko, Yoshihide Kihara

Institution: Tokyo Electron (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409655690

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