Work

Pattern-shaping technology enables improvements of logic layouts patterning beyond 15nm tip-to-tip

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051391

Authors: Guillaume Schelcher, Victor M. Blanco Carballo, Philippe Leray, Weimin Gao, Chihan Hsu, Yung-Chen Lin, Mike Davidson, Kevin Anglin, Huixiong Dai, Steven Sherman

Institutions: IMEC, ASML (Netherlands), Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655713

FWCI: 4.717

Cites: 2

Cited by: 2

Related to: 10