Radical etching of metals for three-dimensional device fabrication with microwave ECR plasma system
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3049056
Authors: Taku Iwase, Makoto Satake, Yudai Mashiko, Takashi Shiota, Yasushi Sonoda, Yusuke Nakatani, Yichen Kuo, Chihhao Liao, Naoyuki Kofuji
Institutions: Hitachi (Japan), Hitachi High-Tech (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655727