Low global warming fluorinated carbonyl compounds for plasma etching of SiO2 and Si3N4
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3050933
Authors: Daeun Hong, Sumin Park, Eunsu Lee, Minsung Jeon, Heeyeop Chae
Institution: Sungkyunkwan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
SDG: Climate action
Open Access status: closed
OpenAlex ID: W4409655734