Novel use of direct self-assembly technique for patterning trench contact lines with excellent control of line variability
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3052053
Authors: Kunal Patankar, Gurpreet Singh, Krishna Ganesan, Florian Gstrein
Institution: Intel (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655740