Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings
Year: 2025
Type: article
DOI: 10.1116/6.0004256
Authors: Jun-Hyeok Jeon, Sun Gil Kim, Hyun-Mi Kim, Hye-Young Kim, Chang-sub Park, Yong Soo Lee, Seul-Gi Kim, Hyeongkeun Kim, Jae-Boong Choi
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G3170114606, G3840362972, G6823130731
OpenAlex ID: W4409669253