Work

Beyond design-rule test pattern coverage for low-K1 hotspot and process variability reduction

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3055695

Authors: Elizabeth Grubbs, Enas Sakr, Yan Feng, Jirka Schatz, Parag Ghosh, Lena Zavyalova, Folarin Latinwo, Zac Levinson, Juergen Preuninger, Kevin Lucas

Institutions: Synopsys (United States), Synopsys (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409672882

FWCI:

Cites: 12

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Related to: 10