How to achieve tip-to-tip patterning beyond the resolution limit: gas cluster beam (GCB) directional etch for sub-15nm T2T metal PnR with 0.33 NA EUV single print
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051069
Authors: Syamashree Roy, Arame Thiam, Yannick Feurprier, Nobuyuki Fukui, Chimaobi Mbanaso, Kaushik Sah, Bobo Cheng, Zhijin Chen, Luis Fernandez, Nayoung Bae, Kathleen Nafus, Atsushi Tsuboi, Soobin Hwang, Werner Gillijns, Victor M. Blanco Carballo
Institutions: IMEC, Tokyo Electron (Japan), KLA (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409677250