Work

Wafer shape engineering for overlay improvement

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3049438

Authors: Anthony R. Schepis, David Conklin, Daniel Fulford, Anton Devilliers, Joshua Hooge, Nathan Ip, Joel Estrella

Institution: Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409677260

FWCI:

Cites: 3

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Related to: 10