Work

Atomic layer etching pitch splitting (APS™): a new alternative to self-aligned double patterning

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3051412

Authors: Jonas Sundqvist, Asif Muhammad, Intu Sharma, Yoana Ilarionova, Robin Atle, Amin Karimi, Reza Jafari Jam, Fred Roozeboom, Dmitry Suyatin

Institution: University of Twente

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409677264

FWCI:

Cites: 7

Cited by:

Related to: 10