Kinetic simulations of low-temperature plasmas used for plasma processing: ICP and feature-scale models
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3051548
Institution: Tech-X Corporation (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409677363
