Work

Patterning exploration of 16 nm pitch metal lines using spacer-is-dielectric EUV-based self-aligned double patterning

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050569

Authors: Stefan Decoster, Vincent Renaud, Yannick Hermans, Chen Wu, Seongho Park, Zsolt Tőkei

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409677376

FWCI: 2.358

Cites: 9

Cited by: 1

Related to: 10